Applied Photometry, Radiometry, and Measurements of Optical Losses
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Applied Photometry, Radiometry, and Measurements of Optical Losses

Applied Photometry, Radiometry, and Measurements of Optical Losses


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About the Book


About the Author:

Michael A Bukshtab received M.S. and Ph.D. degrees in "Optical Design and Spectroscopy" and in "Physical Optics" from The Technical University of Fine Mechanics & Optics and from The Vavilov' State Optical Institute, and had post-doctoral tenure analyzing high-purity silica glasses and specialty fibers in The Institute of Silicate Chemistry, Academy of Sciences - all in St. Petersburg (Leningrad), Russia. His M.S. thesis received the Best Diploma award among nearly 30 Leningrad technical universities and was published in "Measurement Techniques" in 1978. Michael's monograph "The Low Loss Measurement Techniques," 165 pages, was published in 1988 by Energoatomizdat, Moscow-Leningrad. Another book: M.A. Bukshtab, A. S. Doynikov, and V. N. Koromislichenko, "Photometry and Radiometry for Engineers" (editors M. A. Bukshtab and A. A. Wolkenstein) by Polytechnika, Leningrad (St. Petersburg), 1991, was announced for publication, book proofs were printed, but manuscript was left unpublished, as Michael immigrated to the USA. Michael was elected by employees the Board Chairman of Leningrad's Institute of Telecommunications, where he served from 1989 until immigrating in 1991. In USA Michael worked on design, development, and fabrication of optical systems and components for such companies as Sandoz, Corning, Pirelli, Kodak, CIENA, Lucent, and GE Advanced Materials. Michael latest experience via Michael A Bukshtab Consulting includes designing complex systems and components and investigating various optical properties -measurement of color-shifting, polarization-dependent, backreflection, backscattering and other low-loss related phenomena, designing all-optical wavelength-switching and cross-connect systems and OADM networks, working on terabit optical routers and optical backplanes, investigating EUV lithography systems, interferometric and diffraction-based positioning sensors, improving fiber-laser and EDFA-based air-to-ground ranging lidars. Michael has authored and coauthored more than 30 Patents or Invention Certificates and participated in more than 70 Scientific Publications and Conference Presentations.


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Product Details
  • ISBN-13: 9789401785266
  • Publisher: Springer
  • Publisher Imprint: Springer
  • Edition: 2012 ed.
  • Language: English
  • Returnable: Y
  • Spine Width: 38 mm
  • Width: 152 mm
  • ISBN-10: 9401785260
  • Publisher Date: 24 Feb 2014
  • Binding: Paperback
  • Height: 229 mm
  • No of Pages: 712
  • Series Title: Springer Series in Optical Sciences
  • Weight: 1047 gr


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